Semi Conductor - XeF2 Pulsing Etcher

Etch silicon hands-on! Learn isotropic etching with XeF2 in a vacuum chamber. Explore fluorine selectivity, etch rates (1-2 μm/min), and factors affecting them. Handle 4-inch wafers & observe etching live. Gain insights into advanced techniques crucial for semiconductor fabrication.

Categories: Semiconductor, Career Discovery
Grades: Grades 9-12
Variant: Guided
Standards: NGSS Physical Science, NGSS Engineering
Plays on: VRDesktopWeb

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Lab objectives and outcomes

Students will be able to explain the principle of isotropic silicon etching using XeF2, detailing the role of fluorine selectivity.
Students will be able to demonstrate the correct sequence of steps for loading a 4-inch silicon wafer and initiating the XeF2 pulsing etch process in the virtual vacuum chamber.
Students will be able to determine how adjusting XeF2 pulsing parameters influences the silicon etch rate by observing the etching process live.

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Suggested activities

XeF2 Pulsing Etcher - Semi Conductor Quiz

Pre-assessment

Open

XeF2 Pulsing Etcher - Semi Conductor Discussion

Post-assessment

Open

Track learner progress

Run this simulation with a class and watch it happen: who started, who finished, and how long each learner took. Drill into a run to see what they actually did.

Group sessions

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Semi Conductor - XeF2 Pulsing Etcher

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