First Nano Furnace - Semi Conductor [Timed]

Learn about EasyTube 3000: Custom CVD/annealing for nanostructures & thin films (nanotubes, graphene, Si, etc.). Deposits Si, SiO2, Si3N4 with diverse precursors. Also handles annealing, selenization, sulfurization.

Category: Semiconductor
Grades: Grades 9-12
Variant: Timed
Standards: NGSS Physical Science, NGSS Engineering
Plays on: VRDesktopWeb

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Lab objectives and outcomes

Students will be able to explain the primary functions of the EasyTube 3000 nano furnace and its capabilities for various semiconductor processes like CVD and annealing.
Students will be able to execute the step-by-step procedure for safely loading precursors and initiating a specific material deposition process (e.g., Si, SiO2) using the EasyTube 3000.
Students will be able to analyze real-time process parameters on the EasyTube 3000 interface to ensure successful material deposition and complete the procedure within a specified timeframe.

E-Beam 1 Evaporation - Semi Conductor [Timed Unguided]
Deposit Au, Ti, Ni, Cr, Si, Ge, Pt with this 4-pocket e-beam evaporator (additional materials require clearance). Wafers load onto a stationary holder. System reaches ultra-high vacuum (2e-6 Torr) in ~2 hours with a cryo pump. Real-time thickness monitoring by INFICON XTC/2.
SemiconductorGrades 9-12

Suggested activities

First Nano Furnace - Semi Conductor Quiz

Pre-assessment

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First Nano Furnace - Semi Conductor Discussion

Post-assessment

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Track learner progress

Run this simulation with a class and watch it happen: who started, who finished, and how long each learner took. Drill into a run to see what they actually did.

Group sessions

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SimGenie acts as a built-in lab assistant. A learner who gets stuck can ask for a hint by voice, and it adapts its guidance to what they are doing in the scene.

E-Beam 1 Evaporation - Semi Conductor [Timed]

Deposit Au, Ti, Ni, Cr, Si, Ge, Pt with this 4-pocket e-beam evaporator (additional materials require clearance). Wafers load onto a stationary holder. System reaches ultra-high vacuum (2e-6 Torr) in ~2 hours with a cryo pump. Real-time thickness monitoring by INFICON XTC/2.

SemiconductorGrades 9-12

E-Beam 1 Evaporation - Semi Conductor [Unguided]

Deposit Au, Ti, Ni, Cr, Si, Ge, Pt with this 4-pocket e-beam evaporator (additional materials require clearance). Wafers load onto a stationary holder. System reaches ultra-high vacuum (2e-6 Torr) in ~2 hours with a cryo pump. Real-time thickness monitoring by INFICON XTC/2.

SemiconductorGrades 9-12

Semi Conductor - First Nano Furnace

Learn about EasyTube 3000: Custom CVD/annealing for nanostructures & thin films (nanotubes, graphene, Si, etc.). Deposits Si, SiO2, Si3N4 with diverse precursors. Also handles annealing, selenization, sulfurization.

SemiconductorGrades 9-12

Semi Conductor - XeF2 Pulsing Etcher

Etch silicon hands-on! Learn isotropic etching with XeF2 in a vacuum chamber. Explore fluorine selectivity, etch rates (1-2 μm/min), and factors affecting them. Handle 4-inch wafers & observe etching live. Gain insights into advanced techniques crucial for semiconductor fabrication.

SemiconductorGrades 9-12

Trion ICP / RIE Dry Etch - Semi Conductor

User-friendly Trion etcher: Load lock, touch screen, RIE or ICP power options. Versatile with chlorine & fluorine gases for diverse etch recipes.

SemiconductorGrades 9-12

E-Beam 1 Evaporation - Semi Conductor

Deposit Au, Ti, Ni, Cr, Si, Ge, Pt with this 4-pocket e-beam evaporator (additional materials require clearance). Wafers load onto a stationary holder. System reaches ultra-high vacuum (2e-6 Torr) in ~2 hours with a cryo pump. Real-time thickness monitoring by INFICON XTC/2.

SemiconductorGrades 9-12

First Nano Furnace - Semi Conductor [Timed]

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